Manufacturing integrated circuits involves many complex process steps that require the use of high-purity gases under vacuum conditions in process chambers.For example,semiconductor-processing applications such as microlithography,low-pressure chemical vapor deposition LPCVD),ion beam etching,sputtering,ion beam implantation, and molecular beam epitaxy all require high vacuum maintenance. Likewise, distribution systems that deliver gases such as carbon tetrachloride,trichlorofluoromethan, methylene fluoride, etc. must be tightly sealed in order to prevent emissions and maintain gas purity.
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